Laser additive manufacturing of Si/ZrO2 tunable crystalline phase 3D nanostructures

The current study is directed to the rapidly developing field of inorganic material 3D object production at nano-/micro scale. The fabrication method includes laser lithography of hybrid organic-inorganic materials with subsequent heat treatment leading to a variety of crystalline phases in 3D structures. In this work, it was examined a series of organometallic polymer precursors with different silicon (Si) and zirconium (Zr) molar ratios, ranging from 9:1 to 5:5, prepared via sol-gel method. All mixtures were examined for perspective to be used in 3D laser manufacturing by fabricating nano- and micro-feature sized structures. Their spatial downscaling and surface morphology were evaluated depending on chemical composition and crystallographic phase. The appearance of a crystalline phase was proven using single-crystal X-ray diffraction analysis, which revealed a lower crystallization temperature for microstructures compared to bulk materials. Fabricated 3D objects retained a complex geometry without any distortion after heat treatment up to 1400 degrees C. Under the proper conditions, a wide variety of crystalline phases as well as zircon (ZrSiO4 - a highly stable material) can be observed. In addition, the highest new record of achieved resolution below 60 nm has been reached. The proposed preparation protocol can be used to manufacture micro/nano-devices with high precision and resistance to high temperature and aggressive environment.

Automated summary

This study focuses on the rapidly developing field of inorganic material 3D object production at the nano-/micro scale. The researchers used laser lithography and heat treatment to fabricate a series of organometallic polymer precursors with different silicon and zirconium ratios. The spatial downscaling and surface morphology of these structures were evaluated, and a crystalline phase was confirmed through X-ray diffraction analysis. The fabricated 3D objects retained their complex geometry without distortion after heat treatment, and achieved a new record of resolution below 60 nm. This preparation protocol is promising for the manufacturing of high precision micro/nano-devices with resistance to high temperature and aggressive environments.