4.6 Article

Segregation growth of epitaxial graphene overlayers on Ni(111)

Journal

SCIENCE BULLETIN
Volume 61, Issue 19, Pages 1536-1542

Publisher

SCIENCE PRESS
DOI: 10.1007/s11434-016-1169-9

Keywords

Low energy electron microscopy; Graphene; Ni(111); CVD

Funding

  1. National Natural Science Foundation of China [21373208, 91545204, 21321002]
  2. National Basic Research Program of China [2016YFA0200200, 2013CB834603, 2013CB933100]
  3. Strategic Priority Research Program of the Chinese Academy of Sciences [XDB17020200]
  4. Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences (SINANO)

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The orientation control of graphene overlayers on metal surface is an important issue which remains as a challenge in graphene growth on Ni surface. Here we have demonstrated that epitaxial graphene overlayers can be obtained by annealing a nickel carbide covered Ni(111) surface using in situ surface imaging techniques. Epitaxial graphene islands nucleate and grow via segregation of dissolved carbon atoms to the top surface at about 400 A degrees C. This is in contrast to a mixture of epitaxial and non-epitaxial graphene domains grown directly on Ni(111) at 540 A degrees C. The different growth behaviors are related to the nucleation dynamics which is controlled by local carbon densities in the near surface region.

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