Site-selective growth of two-dimensional materials: strategies and applications

Over the years, there have been major advances in two-dimensional (2D) materials on account of their excellent and unique properties. Among the various strategies for 2D material fabrication, chemical vapor deposition (CVD) is considered as the most promising method to achieve large-area and high-quality 2D film growth. Furthermore, to realize the potential applications of 2D materials in different fields, the integration of 2D materials into functional devices is essential. However, the materials made by common CVD are randomly distributed on substrates, which is disadvantageous for fabricating arrays of devices. To solve this problem, a site-selective growth method was developed to meet the requirement of batch production for practical applications because it achieves control over the locations of products and benefits the subsequent direct integration. Herein, state-of-the-art methods for site-selective synthesis, including seeded growth and patterned growth, are reviewed. Then, the electronic and optoelectronic applications of the as-grown 2D materials are also reviewed. Finally, the remaining challenges and future prospects regarding site-selective methods and applications are discussed.

Automated summary

Chemical vapor deposition (CVD) is considered as the most promising method for fabricating large-area and high-quality 2D films. However, the random distribution of materials made by common CVD is disadvantageous for device fabrication. To solve this problem, site-selective growth methods have been developed. This review summarizes the state-of-the-art methods for site-selective synthesis and discusses the applications and challenges of as-grown 2D materials.