4.6 Article

Optimization of the Growth Process of Double Perovskite Pr2-δNi1-xMn1+xO6-y Epitaxial Thin Films by RF Sputtering

Journal

MATERIALS
Volume 15, Issue 14, Pages -

Publisher

MDPI
DOI: 10.3390/ma15145046

Keywords

ferromagnetic insulator; double perovskite; sputtering thin film growth

Funding

  1. Spanish Ministry of Science and Innovation through Severo Ochoa [CEX2019-000917-S]
  2. SPINCURIOX - European Regional Development Funds [RTI2018-099960-BI00]

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Epitaxial thin films of high-quality PNMO double perovskite were successfully grown on SrTiO3 substrates by RF magnetron sputtering, and the influence of growth parameters on the film properties was investigated.
Epitaxial thin films of Pr2-delta Ni1-xMn1+xO6-y (PNMO) double perovskite were grown on (001)-oriented SrTiO3 substrates by RF magnetron sputtering. The influence of the growth parameters (oxygen pressure, substrate temperature, and annealing treatments) on the structural, magnetic and transport properties, and stoichiometry of the films was thoroughly investigated. It is found that high-quality epitaxial, insulating, and ferromagnetic PNMO thin films can only be obtained in a narrow deposition parameter window. It is shown that a careful selection of the growth conditions allows for obtaining a high degree of Ni/Mn cation ordering, which is reflected in the values of the Curie temperature, T-C, and saturation magnetization, M-S, which are very close to those of bulk material.

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