4.3 Article

Determination of the cationic distribution in oxidic thin films by resonant X-ray diffraction: the magnetoelectric compound Ga2-xFexO3

Journal

JOURNAL OF APPLIED CRYSTALLOGRAPHY
Volume 49, Issue -, Pages 1308-1314

Publisher

INT UNION CRYSTALLOGRAPHY
DOI: 10.1107/S1600576716010001

Keywords

resonant X-ray diffraction; cationic distribution; magnetoelectric oxide thin films

Funding

  1. CNRS
  2. Ministere de l'Enseignement Superieur et de la Recherche (Paris)
  3. international ANR DFG chemistry project GALIMEO [2011-INTB-1006-01]
  4. Laboratory of Excellence 'Nanostructures in Interaction with their Environment' [LabEx NIE 11-LABX-0058-NIE]

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The cationic distribution is decisive for both the magnetic and electric properties of complex oxides. While it can be easily determined in bulk materials using classical methods such as X-ray or neutron diffraction, difficulties arise for thin films owing to the relatively small amount of material to probe. It is shown here that a full determination of the cationic site distribution in thin films is possible through an optimized processing of resonant elastic X-ray scattering experiments. The method is illustrated using gallium ferrite Ga2-xFexO3 samples which have been the focus of an increasing number of studies this past decade. They indeed represent an alternative to the, to date, only room-temperature magnetoelectric compound BiFeO3. The methodology can be applied to determine the element distribution over the various crystallographic sites in any crystallized system.

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