Journal
OPTICAL COMPONENTS AND MATERIALS XIX
Volume 11997, Issue -, Pages -Publisher
SPIE-INT SOC OPTICAL ENGINEERING
DOI: 10.1117/12.2614601
Keywords
Titanium dioxide; Thin-film lithium niobate; Reactive sputtering deposition; Low-loss waveguide; Dielectric lift-off
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Funding
- Office of Naval Research (ONR) [N00014-21-1-2263]
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This paper presents the use of TiO2 as a strip loaded waveguide on thin-film lithium niobate (TFLN). The waveguides were fabricated using RF reactive sputtering deposition and dielectric lift-off process, with an additional layer of SiO2 deposited as a cladding layer using PECVD. The characterization of the process was done using AFM and ellipsometer. The experimental measurement using OBR showed a propagation loss of 1.26dB/cm at 1550nm.
This paper presents the use of TiO2 as a strip loaded waveguide on thin-film lithium niobate (TFLN). The waveguides were fabricated by using an RF reactive sputtering deposition followed by a dielectric lift-off process. An additional layer of SiO2 was deposited as a cladding layer using a plasma-enhanced chemical vapor deposition (PECVD). To characterize this process, atomic-force-microscopy (AFM) and an ellipsometer were used. Lastly, a propagation loss of 1.26dB/cm at 1550nm was experimentally measured by Optical Backscatter reflectometry (OBR) and are presented in this paper.
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