4.4 Article

Interplay Between Charge Trapping and Polarization Switching in BEOL-Compatible Bilayer Ferroelectric Tunnel Junctions

Journal

IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY
Volume 10, Issue -, Pages 593-599

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JEDS.2022.3171217

Keywords

Switches; Electrodes; Tin; Films; Dielectrics; Tunneling; Memristors; Ferroelectric tunnel junction; FTJ; HZO; synaptic memristor; charge trapping; interfacial charge; polarization switching; neuromoprhic computing; artificial intelligence

Funding

  1. European Union through the BeFerroSynaptic Project [GA:871737]

Ask authors/readers for more resources

We present a combined experimental and theoretical analysis of polarization switching in ferroelectric tunnel junctions. The injection and trapping of charge into the ferroelectric-dielectric stack are found to have a significant impact on the polarization switching. Our findings are important for understanding the physical processes and designing devices for memory and memristor applications.
We here report a joint experimental and theoretical analysis of polarization switching in ferroelectric tunnel junctions. Our results show that the injection and trapping of charge into the ferroelectric-dielectric stack has a large influence on the polarization switching. Our results are relevant to the physical understanding and to the design of the devices, and for both memory and memristor applications.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available