4.6 Article

Pronounced Optoelectronic Effect in n-n ReS2 Homostructure

Journal

ACS APPLIED ELECTRONIC MATERIALS
Volume 4, Issue 9, Pages 4306-4315

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsaelm.2c00567

Keywords

ReS2; homostructure; density functional theory; field-effect transistor; infrared; responsivity

Funding

  1. national research foundation of Korea (NRF) [ARQ202101038001]
  2. Korean Government (MIST) [NRF- 2019R1A2C2090443]
  3. Technology Innovation Program [ARQ202101038001]
  4. Ministry of Trade, Industry & Energy (MOTIE, Korea) [NRF2017M3A7B4041987]
  5. Korea Environment Industry & Technology Institute (KEITI) - Korea Ministry of Environment (MOE) [20013621]
  6. Korea Environmental Industry & Technology Institute (KEITI) [ARQ202101038001] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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In this study, a homojunction device fabricated using ReS2 flakes was reported, and its p-n diode characteristics were observed. The contact resistance and intrinsic mobility of ReS2 field-effect transistors with different thicknesses were evaluated, showing a decrease in contact resistance and an increase in intrinsic mobility with increasing thickness. The rectifying behavior of a vertical ReS2 (thin)-ReS2 (thick) homostructure was measured, and the broadband near-infrared response of a single-flake homostructure of ReS2 was observed. The findings of this study are of importance for the advancement of electronic devices.
Two-dimensional layered materials have attracted attention for optoelectronic applications owing to their remarkable photonic properties. Here, we report a homojunction device fabricated using n-type ReS2 flakes; the device exhibits p-n diode characteristics. The band structures of 1-5 L ReS2 are theoretically calculated, and the insensitivity of work function to the thickness is experimentally investigated using Kelvin probe force microscopy. The contact resistance and intrinsic mobility of ReS2 field-effect transistors with different thicknesses are evaluated using the Y-function method (YFM). As the thickness of the flakes increases, the contact resistance decreases while the intrinsic mobility increases, leading to a reduction in the threshold voltage. Moreover, the rectifying behavior of a vertical ReS2 (thin)-ReS2 (thick) homostructure is measured at various bias and gate voltages, where the devices exhibit a noticeable rectification ratio of similar to 4 x 10(2) at V-d = 5 V and V-g = 20 V. The ideality factor of the devices is similar to 1.16 at V-g = -20 V. In addition, broadband near-infrared (NIR) response of the single-flake homostructure of ReS2 is observed, and it exhibited a responsivity of 170.9 A W-1 at 365 nm. Our study of the ReS2 homostructure leads to the advancement in electronic devices, such as photodetectors, transistors, and photovoltaic cells of new technology.

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