Journal
MRS COMMUNICATIONS
Volume 12, Issue 6, Pages 1250-1255Publisher
SPRINGER HEIDELBERG
DOI: 10.1557/s43579-022-00303-4
Keywords
Film; Heterostructure; Photovoltaic
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By using thin films placed in the p-type and n-type layer interface in photovoltaic devices, it has been reported that the short-circuit current density (J(sc)) increases, despite a decrease in the open-circuit voltage (V-oc). In this study, a novel architecture with the deposition of a CdSe0.6Te0.4 ultra-thin film inside the p-type layer is proposed to increase light absorbance and improve power conversion efficiency compared to conventional structures.
It has been reported with the use of thin films placed in the p-type and n-type layer interface in photovoltaic devices, the short-circuit current density (J(sc)) increases, this spite of decreasing the open-circuit voltage (V-oc). In this work, in order to increase the light absorbance, and therefore, contribute to an increment in J(sc) and V-oc, a novel architecture has been proposed by the deposition of a CdSe0.6Te0.4 ultra-thin film placed inside de p-type layer. The proposed structure exhibited an increment in power conversion efficiency compared to another fabricated with the conventional structure.
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