Journal
ADVANCED MATERIALS INTERFACES
Volume 3, Issue 8, Pages -Publisher
WILEY
DOI: 10.1002/admi.201500849
Keywords
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Funding
- Ministry of Science and Technology [MOST 103-2221-E-006-029-MY3, MOST 105-2623-E-006-002-ET, MOST 104-2119-M-006-004]
- Top-Notch Project under the Headquarter of University Advancement at National Cheng Kung University - Ministry of Education, Taiwan, ROC
- Research Center for Energy Technology and Strategy (RCETS)
- Advanced Optoelectronic Technology Center (AOTC), National Cheng Kung University
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Vapor-based deposition technique is considered as a promising approach for preparing a high-quality and uniform perovskite thin film. With evolution from coevaporation deposition to a low-pressure vapor-assisted solution process, both energy budget and reaction yield for perovskite film fabrications are improved. In this paper, a low-pressure hybrid chemical vapor deposition (LPHCVD) method is applied to fabricate CH3NH3PbI3 perovskite films. The crucial dependence of working pressure on the perovskite formation is revealed. Moreover, the reaction time plays an important role in controlling the quality of the synthesized perovskite film. Efficient perovskite solar cells of 14.99% (mesoscopic), 15.37% (planar), and perovskite modules (active area of 8.4 cm(2)) of 6.22% are achieved by this LPHCVD method.
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