Journal
SPIE LASER DAMAGE: LASER-INDUCED DAMAGE IN OPTICAL MATERIALS 2022
Volume 12300, Issue -, Pages -Publisher
SPIE-INT SOC OPTICAL ENGINEERING
DOI: 10.1117/12.2641792
Keywords
Pulsed-laser deposition; Laser-induced damage testing; Sesquioxides; Metal oxides; Sub-picosecond regime
Categories
Funding
- European Union [813159]
- EPSRC
- Rigaku SmartLab [EP/K009877/1, EP/K00509X/1, EP/V035975/1]
- EPSRC Doctoral Prize [EP/T517859/1, EP/N018281/1, EP/P027644/1]
- Marie Curie Actions (MSCA) [813159] Funding Source: Marie Curie Actions (MSCA)
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Crystalline sesquioxide films produced by pulsed-laser deposition showed similar laser damage resistance to amorphous magnetron-sputtered thin films. This finding is crucial for the design of damage resistant reflective components used in ultrashort-pulse lasers.
Crystalline sesquioxide films (Sc2O3, Y2O3, Lu2O3) produced by pulsed-laser deposition were examined for laser damage resistance with pulses of 500 fs duration, at a wavelength of 1030 nm and at a 10 Hz repetition rate. Comparable tests were performed with amorphous magnetron-sputtered thin films (SiO2, HfO2, Nb2O5). We found the laser-induced damage thresholds of the sesquioxides are close to those of HfO2 in the multi-pulse test regime. The results are the basis for designs of damage resistant reflective components used in ultrashort-pulse lasers.
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