4.8 Article

Boosting thermoelectric performance of p-type SiGe alloys through in-situ metallic YSi2 nanoinclusions

Journal

NANO ENERGY
Volume 27, Issue -, Pages 282-297

Publisher

ELSEVIER
DOI: 10.1016/j.nanoen.2016.07.002

Keywords

Thermoelectrics; Thermal conductivity; Nanoindusions; Coherent interfaces; Tunneling; Phonon scattering

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Incorporation of metallic yttrium silicide nanoparticles in p-type SiGe alloys matrix is demonstrated to enhance their thermoelectric performance. In this work, we report a thermoelectric figure-of-merit (ZT) of similar to 1.81 (at 1100 K) in p-type SiGe alloys (that is similar to 34% higher as compared to earlier best reported ZT value) by intentional incorporation of metallic yttrium silicide (YSi2) nano-inclusions. The YSi2 nanoinclusions were in-situ formed in p-type SiGe matrix by its reaction with Y2O3 nanoparticles (<= 6 wt%) during vacuum hot pressing at 1423 K under a pressure of 50 kg/cm(2). YSi2 nanoinclusions form coherent interfaces with SiGe matrix and facilitate a reduction in the grain size of SiGe. These factors cause a strong suppression of thermal conductivity (kappa(SiGe)similar to 3.86 Wm(-1) K-1 and KSiGe-YSi2 similar to 2.38 W m(-1) K-1 at 1100 K) without affecting the power factor, and therefore, results in a dramatic enhancement of ZT. In addition, SiGe-YSi2 nanocomposites exhibit enhancement in mechanical hardness, enhanced average ZT as well as compatibility factor, which are additional useful characteristics for practical applications. (C) 2016 Elsevier Ltd. All rights reserved.

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