4.7 Article

Interface engineering constructs oxide composite bulk γ' -Fe4N magnetic alloys with high resistivity: Superior magnetization and manufacturability

Journal

JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
Volume 175, Issue -, Pages 212-222

Publisher

JOURNAL MATER SCI TECHNOL
DOI: 10.1016/j.jmst.2023.07.033

Keywords

Nitriding mechanism; SPS; Saturation magnetization; Resistivity; Composite gamma' -Fe4N bulk

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In this study, a high resistance oxide interface engineering was constructed to achieve the combination of high saturation magnetization and high resistivity in a newly Fe-N based magnetic material. The research findings are of great significance for the development of the next generation of soft magnetic materials.
Soft magnetic material with high saturation magnetization (M-s) and high resistance (rho) is vital to improve the power density and conversion efficient of modern electrical magnetic equipment. Yet, increasing Ms is always at the expense of high resistivity, such as soft magnetic alloys substitute for the ferrite. In this work, the superior comprehensive electromagnetic properties, namely the close association of high saturation magnetization and high resistivity, are combined in a new way in a newly Fe-N based mag-netic materials. A high resistance oxide interface engineering was constructed between the conducting ferromagnetic phases in the process of spark plasma sintering (SPS) to achieve superior electromagnetic properties. The ZnO composite gamma '-Fe4N bulk has a maximum resistivity of 220 mu Omega cm and a M(s )of up to 156.02 emu/g, while the TiO2 composite gamma '-Fe4N bulk has a maximum resistivity of 379 mu Omega cm and a M-s of 149.7 emu/g. The research findings offer valuable insights for the advancement of the next generation of soft magnetic materials, which hold significant potential for use in high-frequency, high-efficiency, and energy-saving power equipment applications.(c) 2023 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.

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