Auxetic Photonic Patterns with Ultrasensitive Mechanochromism

Photonic crystals with mechanochromic properties are currently under intensive study to provide intuitive colorimetric detection of strains for various applications. However, the sensitivity of color change to strain is intrinsically limited, as the degree of deformation determines the wavelength shift. To overcome this limitation, auxetic photonic patterns that exhibit ultra-sensitive mechanochromism are designed. These patterns have a regular arrangement of cuts that expand to accommodate the strain, while the skeletal framework undergoes torsional deformation. Elastic photonic crystals composed of a non-close-packed array of colloidal particles are embedded in the cut area of the auxetic patterns. As the cut area amplifies the strains, the elastic photonic crystals show significant color change even for small total strains. The degree of local-strain amplification, or sensitivity of color change, is controllable by adjusting the width of cuts in the auxetic framework. In this work, a maximum sensitivity of up to 60 nm/% is achieved, which is 20 times higher than bulk films. It is believed that the auxetic photonic patterns with ultra-sensitive mechanochromism will provide new opportunities for the pragmatic use of mechanochromic materials in various fields, including structural health monitoring. Auxetic photonic patterns are designed to provide ultra-sensitive mechanochromism. As the strains are locally amplified in the cut areas of the auxetic patterns, elastic photonic crystals in the cuts show significant color change even for small total strains. The sensitivity is as high as 60 nm/%, which is 20 times improved from bulk films, enabling intuitive colorimetric monitoring of strains.image

Automated summary

Auxetic photonic patterns are designed to provide ultra-sensitive mechanochromism. As the strains are locally amplified in the cut areas of the auxetic patterns, elastic photonic crystals in the cuts show significant color change even for small total strains. The sensitivity is as high as 60 nm/%, which is 20 times improved from bulk films, enabling intuitive colorimetric monitoring of strains.