Joule magnetostriction and volume magnetostriction of Iron Gallium thin films

The main aim of this work is to evaluate magnetostriction performances, including Joule magnetostriction and volume magnetostriction, of FeGa thin films synthesized by electrodeposition and ion-beam sputtering. This research demonstrated that the electrodeposited Fe((100-x))Gax (x: 19 similar to 26) films had a tensile stress, and the ionbeam sputtered Fe81Ga19 film had a compressive stress. In both films, the easy axis of magnetization was in the in-plane direction. Both films exhibited nearly (1 1 0)-oriented polycrystalline structures. For the ion-beam sputteredFe(81)Ga(19)film, the observed volume magnetostriction was 39 ppm, approximately one-third of the Joule magnetostriction of 116 ppm. For electrodepositedFe(81)Ga(19), the Joule and volume magnetostrictions were 64 ppm and 46 ppm, respectively. An important conclusion of this research was that the FeGa films formed by non-equilibrium growth processes displayed a large volume magnetostriction.

Automated summary

The aim of this study was to evaluate the magnetostriction performance of FeGa thin films synthesized by different methods. It was found that the electrodeposited films exhibited tensile stress, while the ion-beam sputtered film showed compressive stress. Both films had an in-plane easy axis of magnetization and (1 1 0)-oriented polycrystalline structures. The volume magnetostriction of the ion-beam sputtered film was approximately one-third of the Joule magnetostriction, while the electrodeposited film had lower magnetostriction values.