4.7 Article

Printing flexible Cu-Ni traces with high conductivity and high thermal stability by in-situ formed multiscale core-shell structures in inks

Journal

APPLIED SURFACE SCIENCE
Volume 646, Issue -, Pages -

Publisher

ELSEVIER
DOI: 10.1016/j.apsusc.2023.158967

Keywords

Copper; Oxidation; Multiscale core-shell structures; Copper-nickel hybrid inks; Conductivity; Ultrahigh reliability

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This study proposes a hybrid ink containing Cu/Ni complexes and Cu particles for direct printing of high-performance Cu-Ni alloy traces. The nanoparticles formed by the decomposition of the complexes effectively bridge the interfaces among Cu particles, resulting in printed traces with low resistivity and excellent mechanical stability. The obtained Cu-Ni alloy traces exhibit multiscale core-shell structures and show strong potential for use in advanced electronics manufacturing.
Direct printing of flexible Cu traces is one of the most promising additive manufacturing technologies in advanced electronics because it is a cost-effective and environmentally friendly process. However, the low oxidation resistance of Cu is currently a critical issue for the preparation of high-performance metallic inks and the manufacturing of reliable printed traces. Herein, we propose a hybrid ink containing Cu/Ni complexes and Cu particles that can be directly printed onto polyimide substrates to generate high-performance Cu-Ni alloy traces by low-temperature preheating and intense pulsed-light irradiation. The nanoparticles in-situ formed by the decomposition of the complexes effectively bridge the interfaces among Cu particles, allowing the printed traces after subsequent intense pulsed-light irradiation to achieve a low resistivity of 29.4 mu omega & sdot;cm and excellent mechanical stability at a bending radius of 7 mm. Strikingly, the obtained Cu-Ni alloy traces achieve multiscale core-shell structures because of the heterogeneous nucleation and passivation of Ni, which enables the printed traces to maintain high conductivity and oxidation resistance even at 250 degrees C in the air, showing strong potential for use in advanced electronics manufacturing.

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