Comparative assessment of TiN thin films created by plasma deposition technique on the surface features of NiCr alloys for dental applications

Introduction: Surface treatment is an important technique to increase adhesion between implants and bones, improving its mechanical characteristics and consequently the patient's comfort. Objectives: Ni-Cr alloys were the object of study in this work, with the purpose of analyzing and evaluating the effect of thin films deposition of titanium nitride via plasma, on its surface and comparing with cathodic cage (CC) and hollow cathode (HC) methods, for dental applications. Methods: Eighteen samples were prepared and the experiment was conducted in two steps: the pre-sputtering (1h, 350 degrees C, gases: Ar and H) and sputtering (4h, 450 degrees C, gases: Ar, Ni, and H). To characterize and compare the samples with those of reference, the Scanning Electron Microscopy (SEM), X-Ray Diffraction (XRD), Vickers Microhardness and wettability tests were used. Results: The results presented by SEM showed that during the surface treatment using CC, voids were formed, and using HC, the samples showed a more homogenous behavior. In microhardness tests, using a 25gf load, it was possible to observe that the HC method allowed an increase of 87% when compared to the reference and treated samples. Significance: Lastly, it can be concluded that both methods are suitable for Ni-Cr alloy surface treatment, and the HC technique, a method already used by dental professionals, presents better results due to the formation of a thicker film layer.

Automated summary

Surface treatment is a crucial technique for enhancing the adhesion between implants and bones, improving mechanical characteristics, and enhancing patient comfort. In this study, Ni-Cr alloys were examined and compared with thin films deposition using titanium nitride via plasma, cathodic cage, and hollow cathode methods for dental applications. The hollow cathode technique demonstrated better results due to the formation of a thicker film layer.