Sequence-defined polypeptoid CARs for electron-beam and EUV lithography

Polymeric photoresists are limited in their sensitivity, resolution, and line-edge roughness due in large part to their molar mass distribution and variation in composition of single polymer chains. While most synthetic polymers, have monomer units distributed randomly along the polymer chain, polypeptoids are, however, characterized by low stochastics i.e., identical chains with extremely low chemical, structural, and molar mass variability with a widely adjustable length and composition. In this work we describe the synthesis of 10 repeat-unit polypeptoids designed as a photopolymer and demonstrate their potential as CARs evaluated by electron-beam, DUV and extreme-UV lithography, obtaining well defined line-space patterns of less than 30 nm half-pitch.

Automated summary

Polymeric photoresists suffer from limitations in sensitivity, resolution, and line-edge roughness due to their molar mass distribution and variation in composition. However, polypeptoids offer a solution as they exhibit low stochastics, with identical chains that have minimal chemical, structural, and molar mass variability and adjustable length and composition. This study presents the synthesis of 10 repeat-unit polypeptoids that act as a photopolymer and demonstrates their potential for CARs in electron-beam, DUV, and extreme-UV lithography, achieving well-defined line-space patterns below 30 nm half-pitch.