Journal
ACS MACRO LETTERS
Volume 5, Issue 3, Pages 287-291Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acsmacrolett.5b00908
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Funding
- Korea government (MSIP) [2015R1A2A2A01006008, 2012M3A7B4049863, 2012M3A7B4035323]
- Global Frontier R&D Program on Center for Hybrid Interface Materials (HIM) - Ministry of Science, ICT & Future Planning [2013M3A6B1078869]
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Block copolymer (BCP) lithography has generally been synonymous to one- or two-dimensional single layered lithographic templates as a means to fabricate simple nanoscaled structures. Recently, the rapidly increasing demand for complex nanostructures and the corresponding evolution in BCP lithography have led to three-dimensional (3D) BCP nanostructures, which can be fabricated in various ways such as directed self-assembly or stacking of cross-linked BCP patterns. This review covers the recent advances in the 3D multilayered structures from cross-linkable BCPs, which provide an easy and robust means for integrating various BCP structures into one scaffold. In this case, wetting-optimized adjustment of BCP microdomains at the layer interface plays a critical role in the formation of well-defined 3D multilayer nanostructures.
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