4.4 Article

Numerical investigation of depth profiling capabilities of helium and neon ions in ion microscopy

Journal

BEILSTEIN JOURNAL OF NANOTECHNOLOGY
Volume 7, Issue -, Pages 1749-1760

Publisher

BEILSTEIN-INSTITUT
DOI: 10.3762/bjnano.7.168

Keywords

atomic mixing; depth profiling; helium ion microscopy; ion bombardment; numerical simulations; polymers; SDTRIMSP

Funding

  1. National Research Fund (FNR), Luxembourg [C12/MS/4003499 - ICORM]

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The analysis of polymers by secondary ion mass spectrometry (SIMS) has been a topic of interest for many years. In recent years, the primary ion species evolved from heavy monatomic ions to cluster and massive cluster primary ions in order to preserve a maximum of organic information. The progress in less-damaging sputtering goes along with a loss in lateral resolution for 2D and 3D imaging. By contrast the development of a mass spectrometer as an add-on tool for the helium ion microscope (HIM), which uses finely focussed He+ or Ne+ beams, allows for the analysis of secondary ions and small secondary cluster ions with unprecedented lateral resolution. Irradiation induced damage and depth profiling capabilities obtained with these light rare gas species have been far less investigated than ion species used classically in SIMS. In this paper we simulated the sputtering of multi-layered polymer samples using the BCA (binary collision approximation) code SD_TRIM_SP to study preferential sputtering and atomic mixing in such samples up to a fluence of 10(18) ions/cm(2). Results show that helium primary ions are completely inappropriate for depth profiling applications with this kind of sample materials while results for neon are similar to argon. The latter is commonly used as primary ion species in SIMS. For the two heavier species, layers separated by 10 nm can be distinguished for impact energies of a few keV. These results are encouraging for 3D imaging applications where lateral and depth information are of importance.

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