Journal
THIN SOLID FILMS
Volume 600, Issue -, Pages 43-52Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2016.01.011
Keywords
Atmospheric Pressure; Plasma-Enhanced Chemical Vapor Deposition; Microwave Plasma Torch; Titanium Dioxide; Thin Film; Microstructure
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Funding
- French Ministry for Higher Education and Research
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In this study, a microwave plasma torch working at atmospheric pressure has been used for TiO2 thin film synthesis. We first optimised the deposition conditions in order to avoid the formation of powder in the plasma phase. Then, the characterisation of the TiO2 films deposited in the optimised conditions revealed that both morphology and phase structure of the film are radial dependent. At the centre, the film is crystallised, exhibiting a well-defined columnar microstructure. Meanwhile, at the periphery, the film is amorphous, with a cauliflower-like structure. (C) 2016 Elsevier B.V. All rights reserved.
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