4.5 Article

Fabrication of fully undercut ZnO-based photonic crystal membranes with 3D optical confinement

Journal

SUPERLATTICES AND MICROSTRUCTURES
Volume 97, Issue -, Pages 397-408

Publisher

ACADEMIC PRESS LTD- ELSEVIER SCIENCE LTD
DOI: 10.1016/j.spmi.2016.07.006

Keywords

Zinc oxide films; II-VI semiconductors; Photonic crystals; Reactive ion etching; Photoluminescence

Funding

  1. Evangelisches Studienwerk e.V
  2. Deutsche Forschungsgemeinschaft (DFG) [SFB TRR 142, GRK 1464]

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For studying nonlinear photonics, a highly controllable emission of photons with specific properties is essential. Two-dimensional photonic crystals (PhCs) have proven to be an excellent candidate for manipulating photon emission due to resonator-based effects. Additionally, zinc oxide (ZnO) has high susceptibility coefficients and therefore shows pronounced nonlinear effects. However, in order to fabricate such a cavity, a fully undercut ZnO membrane is required, which is a challenging problem due to poor selectivity of the known etching chemistry for typical substrates such as sapphire or ZnO. The aim of this paper is to demonstrate and characterize fully undercut photonic crystal membranes based on a thin ZnO film sandwiched between two layers of silicon dioxide (SiO2) on silicon substrates, from the initial growth of the heterostructure throughout the entire fabrication process. This process leads to a fully undercut ZnO-based membrane with adjustable optical confinement in all three dimensions. Finally, photonic resonances within the tailored photonic band gap are achieved due to optimized PhC-design (in-plane) and total internal reflection in the z-direction. The presented approach enables a variety of photon based resonator structures in the UV regime for studying nonlinear effects, including photon-exciton coupling and all-optical switching. (C) 2016 Elsevier Ltd. All rights reserved.

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