Journal
SENSORS
Volume 16, Issue 5, Pages -Publisher
MDPI
DOI: 10.3390/s16050616
Keywords
surface ion trap; electrode dimensions; design optimization; boundary element method; microfabrication
Funding
- ITRC (Information Technology Research Center) support program of MSIP/IITP [IITP-2016-R0992-16-1017]
- ICT R&D program of MSIP/IITP [10043464]
- Institute for Information & Communication Technology Planning & Evaluation (IITP), Republic of Korea [R0992-16-1017] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
- Ministry of Public Safety & Security (MPSS), Republic of Korea [R0101-15-0068] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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Ion traps can provide both physical implementation of quantum information processing and direct observation of quantum systems. Recently, surface ion traps have been developed using microfabrication technologies and are considered to be a promising platform for scalable quantum devices. This paper presents detailed guidelines for designing the electrodes of surface ion traps. First, we define and explain the key specifications including trap depth, q-parameter, secular frequency, and ion height. Then, we present a numerical-simulation-based design procedure, which involves determining the basic assumptions, determining the shape and size of the chip, designing the dimensions of the radio frequency (RF) electrode, and analyzing the direct current (DC) control voltages. As an example of this design procedure, we present a case study with tutorial-like explanations. The proposed design procedure can provide a practical guideline for designing the electrodes of surface ion traps.
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