Journal
REVIEW OF SCIENTIFIC INSTRUMENTS
Volume 87, Issue 6, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.4954731
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Funding
- RIKEN
- X-ray Free Electron Laser Priority Strategy Program (MEXT)
- Program for Leading Graduate Schools: Interactive Materials Science Cadet Program
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We have developed a method of fabricating speckle-free channel-cut crystal optics with plasma chemical vaporization machining, an etching method using atmospheric-pressure plasma, for coherent X-ray applications. We investigated the etching characteristics to silicon crystals and achieved a small surface roughness of less than 1 nm rms at a removal depth of >10 mu m, which satisfies the requirements for eliminating subsurface damage while suppressing diffuse scattering from rough surfaces. We applied this method for fabricating channel-cut Si(220) crystals for a hard X-ray split-and-delay optical system and confirmed that the crystals provided speckle-free reflection profiles under coherent X-ray illumination. Published by AIP Publishing.
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