Journal
CHINESE PHYSICS B
Volume 24, Issue 2, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/1674-1056/24/2/027101
Keywords
AlGaN/GaN HEMTs; GaN channel layer thickness; off-state breakdown; DIBL
Categories
Funding
- Program for New Century Excellent Talents in University [NCET-12-0915]
- National Natural Science Foundation of China [61334002, 61204086]
Ask authors/readers for more resources
In this paper, the off-state breakdown characteristics of two different AlGaN/GaN high electron mobility transistors (HEMTs), featuring a 50-nm and a 150-nm GaN thick channel layer, respectively, are compared. The HEMT with a thick channel exhibits a little larger pinch-off drain current but significantly enhanced off-state breakdown voltage (BVoff). Device simulation indicates that thickening the channel increases the drain-induced barrier lowering (DIBL) but reduces the lateral electric field in the channel and buffer underneath the gate. The increase of BVoff in the thick channel device is due to the reduction of the electric field. These results demonstrate that it is necessary to select an appropriate channel thickness to balance DIBL and BVoff in AlGaN/GaN HEMTs.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available