Journal
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
Volume 213, Issue 7, Pages 1814-1820Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/pssa.201533022
Keywords
crystal structure; filaments; silicon; silicon oxide; transmission electron microscopy; X-ray photoelectron spectroscopy
Ask authors/readers for more resources
Doped microcrystalline silicon oxide (mu c-SiOx: H) alloys attract significant attention as a functional material in photovoltaic devices. By using various advanced characterization methods, we have studied the relationship between optoelectronic properties, chemical composition, and structure of p-type mu c-SiOx: H deposited by plasma enhanced chemical vapor deposition (PECVD). For a wide range of compositions with varying oxygen content, we show that the dominant components are Si and a-SiO2, while the fraction of suboxides is minor. The mu c-SiOx: H material with sufficient oxygen content (x = 0.35) exhibits an enlarged optical gap E-04> 2.2 eV and sufficiently high dark conductivity > 10(-6)S cm(-1); the crystalline silicon fraction has a filament-like shape (with a typical width of around 10 nm) forming a branch-like structure elongated in the growth direction over several hundreds of nanometers. (C) 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available