Journal
OPTICS LETTERS
Volume 41, Issue 15, Pages 3399-3402Publisher
OPTICAL SOC AMER
DOI: 10.1364/OL.41.003399
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Funding
- National Science Foundation (NSF) [ECCS-1509589]
- University of Missouri Research Board
- Missouri S&T Materials Research Center
- Missouri S&T Energy Research and Development Center
- Directorate For Engineering
- Div Of Electrical, Commun & Cyber Sys [1509589] Funding Source: National Science Foundation
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Microsphere photolithography (MPL) is a practical, cost-effective nanofabrication technique. It uses self-assembled microspheres in contact with the photoresist as microlenses. The microspheres focus incident light to a sub-diffraction limited array of photonic jets in the photoresist. This Letter explores the MPL technique to pattern metal-insulator-metal metasurfaces with near-perfect absorption at mid-wave infrared (MWIR) frequencies. Experimental results are compared to electromagnetic simulations of both the exposure process and the metasurface response. The microsphere self-assembly technique results in a polycrystalline metasurface; however, the metal-insulator-metal structure is shown to be defect tolerant. While the MPL approach imposes geometric constraints on the metasurface design, once understood, the technique can be used to create functional devices. In particular, the ability to tune the resonant wavelength with the exposure dose raises the potential of hierarchical structures. (C) 2016 Optical Society of America
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