Journal
CHEMISTRY LETTERS
Volume 44, Issue 3, Pages 339-341Publisher
CHEMICAL SOC JAPAN
DOI: 10.1246/cl.141025
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- National Institute of Advanced Industrial Science and Technology (AIST)
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The photooxidation of [6,6]-phenyl-C-61-butyric acid methyl ester (PCBM) in thin films and the effects of poly(3-hexylthiophene) (P3HT) on the photooxidation of PCBM were studied using matrix-assisted laser desorption/ionization time-of-flight mass spectrometry. Two reaction routes of PCBM oxidation and its suppression by P3HT were examined for the first time.
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