4.7 Article

Evidence of hexagonal germanium grains on annealed monolayer MoS2

Journal

MATERIALS TODAY ADVANCES
Volume 19, Issue -, Pages -

Publisher

ELSEVIER
DOI: 10.1016/j.mtadv.2023.100401

Keywords

Hexagonal germanium; van der waals epitaxy; Defect engineering; Transition metal dichalcogenides; Grain boundary; Strain

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Growing three-dimensional materials on two-dimensional van der Waals surface is effective for stacking transferrable membranes. Nucleation of hexagonal germanium grains within a continuous crystalline film is achieved by chemical vapor deposition on monolayer molybdenum disulfide substrates. The hexagonal Ge film shows higher reflectivity in the infrared spectral range compared to cubic Ge due to the narrower band gap and higher carrier concentration.
Growing three-dimensional (3D) materials on two-dimensional (2D) van der Waals surface has shown its effectiveness in overcoming materials incompatibility for stacking transferrable membranes toward advanced device manufacturing. Herein, we demonstrate that the nucleation of hexagonal germanium (Ge) grains within a continuous crystalline film, which has been unfeasible through traditional epitaxy techniques, is realized by chemical vapor deposition on top of n-type monolayer molybdenum disulfide (MoS2) substrates. Suggested by quantum molecular dynamics calculation, the hexagonal Ge nucleation is thermodynamically preferable to cubic Ge when growing on monolayer MoS2 with sulfur vacancies. The strained hexagonal Ge grains have been confirmed by transmission electron microscopy analyses from both real space and reciprocal space. Scanning probe microscopy shows that the hexagonal Ge film possesses higher reflectivity in infrared spectral range, implying a higher carrier concentration resulted from the narrower band gap, as compared to cubic Ge.& COPY; 2023 The Author(s). Published by Elsevier Ltd. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).

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