Journal
NANOTECHNOLOGY
Volume 27, Issue 34, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/27/34/345707
Keywords
NiFe thin films; atomic layer deposition; magnetic characterization; electrical characterization; thermal reduction
Funding
- Fondequip [EQM120045, EQM140092]
- Fondecyt [1150952]
- Basal Project [FB0807]
- Conicyt PhD Fellowships Program
- FWO Vlaanderen
- BOF-UGent [GOA 01G01513]
- Hercules foundation [AUGE/09/014]
- DFG [NI-616/18-1]
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Nickel-rich NiFe thin films (Ni92Fe8, Ni89Fe11 and Ni83Fe17) were prepared by combining atomic layer deposition (ALD) with a subsequent thermal reduction process. In order to obtain NixFe1-xOy films, one ALD supercycle was performed according to the following sequence: m NiCp2/O-3, with m = 1, 2 or 3, followed by one FeCp2/O-3 cycle. The supercycle was repeated n times. The thermal reduction process in hydrogen atmosphere was investigated by in situ x-ray diffraction studies as a function of temperature. The metallic nickel iron alloy thin films were investigated and characterized with respect to crystallinity, morphology, resistivity, and magnetism. As proof-of-concept magnetic properties of an array of Ni83Fe17, close to the perfect Permalloy stoichiometry, nanotubes and an isolated tube were investigated.
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