Patterning Techniques in Coplanar Micro/Nano Capacitive Sensors

Rapid technological advancements have led to increased demands for sensors. Hence, high performance suitable for next-generation technology is required. As sensing technology has numerous applications, various materials and patterning methods are used for sensor fabrication. This affects the characteristics and performance of sensors, and research centered specifically on these patterns is necessary for high integration and high performance of these devices. In this paper, we review the patterning techniques used in recently reported sensors, specifically the most widely used capacitive sensors, and their impact on sensor performance. Moreover, we introduce a method for increasing sensor performance through three-dimensional (3D) structures.

Automated summary

Rapid technological advancements have increased the demand for sensors, requiring high-performance capabilities for next-generation technology. Various materials and patterning methods are used in sensor fabrication to meet the wide range of sensing applications. In this paper, we review the patterning techniques used in recently reported sensors, particularly the widely used capacitive sensors, and discuss their impact on sensor performance. Additionally, we introduce a method for enhancing sensor performance through three-dimensional (3D) structures.