Chitosan-Based Films Containing Rutin for Potential Cosmetic Applications

Chitosan is a polysaccharide with film-forming properties. Such properties are widely used for the preparation of beauty masks and wound-healing materials. In this work, chitosan-based films containing hyaluronic acid and rutin have been researched for potential cosmetic applications. Rutin was added to a chitosan solution in lactic acid, and then thin films were fabricated. The structure of the films was studied using FTIR spectroscopy. Surface properties were studied using an AFM microscope. The release of rutin from chitosan-based film was researched by the HPLC method. The properties of the skin, such as elasticity and moisturization, were studied using the Aramo TS 2 apparatus. It was found that the addition of rutin did not have an influence on the chitosan structure but affected its thermal stability. The roughness of the films was bigger after the addition of rutin to chitosan-based films. Skin elasticity and skin moisturization were somewhat improved after the topical application of the proposed chitosan-rutin mask. The maximum release of rutin was found after 20 min at pH 5.5, related to the pH of normal human skin. The average percentage of release from chitosan-based film containing hyaluronic acid was smaller than from chitosan-based films.

Automated summary

The potential cosmetic applications of chitosan-based films containing hyaluronic acid and rutin were studied. Rutin affected the thermal stability and surface roughness of the films, but did not influence the structure of chitosan. The proposed chitosan-rutin mask showed improvements in skin elasticity and moisturization.