4.8 Article

Aluminum Film-Over-Nanosphere Substrates for Deep-UV Surface-Enhanced Resonance Raman Spectroscopy

Journal

NANO LETTERS
Volume 16, Issue 12, Pages 7968-7973

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.6b04296

Keywords

UV resonance Raman spectroscopy (UVRRS); surface-enhanced Raman spectroscopy (SERS); aluminum plasmonics; film-overnanosphere substrates

Funding

  1. National Science Foundation Center for Chemical Innovation dedicated to Chemistry at the Space-Time Limit (CaSTL) [CHE-1414466]
  2. National Science Foundation Materials Research Science and Engineering Center [DMR-1121262]
  3. National Science Foundation [CHE-1506683]
  4. DTRA [HDTRA1-15-1-0038]
  5. University of Tennessee at Knoxville
  6. Division Of Chemistry
  7. Direct For Mathematical & Physical Scien [1414466, 1506683] Funding Source: National Science Foundation

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We report here the first fabrication of aluminum film-over nanosphere (AIFON) substrates for UV surface-enhanced resonance Raman scattering (UVSERRS) at the deepest UV wavelength used to date (2 lambda(ex) = 229 nm). We characterize the AlFONs fabricated with two different support microsphere sizes using localized surface plasmon resonance spectroscopy, electron microscopy, SERRS of adenine, tris(bipyridine)ruthenium(II), and trans-1,2-bis(4-pyridyl)-ethylene, SERS of 6-mercapto-l-hexanol (as a nonresonant molecule), and dielectric function analysis. We find that AIFONs fabricated with the 210 nm microspheres generate an enhancement factor of approximately 10(4-s), which combined with resonance enhancement of the adsorbates provides enhancement factors greater than 10(6). These experimental results are supported by theoretical analysis of the dielectric function. Hence our results demonstrate the advantages of using AlFON substrates for deep UVSERRS enhancement and contribute to broadening the SERS application range with tunable and affordable substrates.

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