The influence of the nanostructure design on the optical, electrical and thermal properties of TiNx thin films prepared by reactive magnetron sputtering

This study investigated the impact of the nanostructure design of titanium nitride (TiNx) thin films on their optical, electrical and thermal properties. The growth designs of the films were tailored using conventional sputtering (series 1) and GLancing Angle Deposition (GLAD) geometries (series 2 and 3). The results showed the potential to modify the properties of thin films by adjusting their nanostructure design, rather than changing their composition. TiNx thin films prepared by GLAD, revealed wider and more significant variations in optical and electrical properties, while the thermal properties seemed to be more affected by the structural changes promoted by the N content in the films. GLAD geometries resulted in the reduction of the film's reflectivity, and colour coordinates, as well as an increase in the electrical resistivity. The thermal parameters of effusivity ratio and diffusivity were reduced as the N/Ti ratio increased.

Automated summary

This study investigated the impact of nanostructure design on the optical, electrical, and thermal properties of titanium nitride (TiNx) thin films. Results showed that modifying the nanostructure design rather than changing the composition can alter the properties of thin films. Thin films prepared by GLancing Angle Deposition (GLAD) exhibited wider and more significant variations in optical and electrical properties, while thermal properties were more affected by structural changes induced by the N content in the films. GLAD geometries resulted in a reduction in film reflectivity and color coordinates, as well as an increase in electrical resistivity. The thermal parameters of effusivity ratio and diffusivity decreased with an increase in the N/Ti ratio.