4K Detectors Array for On-Wafer EUV Imaging in Lithography Control Beyond 5-nm Node

A 4K detector array for on-wafer extreme ultraviolet (EUV) imaging is first-time demonstrated. The proposed detector array features full FinFET CMOS logic compatibility, compact 1T pixel, high spatial resolution, and battery-less sensing. The in situ stored sensed signal can be accessed through offline nondestructive wafer-level tests. EUV images projected on wafers can be truthfully reflected by readout signals, providing in-tool monitoring of critical parameters in advanced lithographical systems for CMOS technologies beyond 5-nm node.

Automated summary

A 4K detector array for on-wafer extreme ultraviolet (EUV) imaging is demonstrated. It is compatible with FinFET CMOS logic, features a compact 1T pixel and high spatial resolution, and operates without a battery. The stored sensed signal can be accessed through nondestructive wafer-level tests. It provides in-tool monitoring of critical parameters in advanced lithographical systems.