4.6 Article

Influence of ion-atom arrival ratio on structure and optical properties of ZrNx films

Journal

MATERIALS LETTERS
Volume 164, Issue -, Pages 291-293

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.matlet.2015.10.037

Keywords

Ion-atom arrival ratio; Zirconium nitride; Ion beam assisted deposition; Optical properties

Funding

  1. Program of China under the Ministry of Science and Technology of China [2015-BAA02B04]

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The influence of ion-atom arrival ratio on composition, micro-structure and optical properties of ZrNx films prepared by ion beam assisted deposition was studied by using XPS, XRD, and spectroscopic ellipsometry. The stoichiometric ZrN is prepared at ion-atom arrival ratio of 1.5. For ZrNx films deposited at ion-atom arrival ratio of 2.4 and 5.0, a strong (220) texture is formed in the ZrNx film. The refractive index of ZrNx films increased with the increase of ion-atom arrival ratio; whereas, a continuous decrease of the extinction coefficient was noticed. (C) 2015 Published by Elsevier B.V.

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