Nanopatterning of Stable Radical Containing Block Copolymers for Highly Ordered Functional Nanomeshes

We present a method for patterning substrates with a regular mesh of stable radical groups. Resulting from advanced block copolymer synthesis and annealing techniques, stable radical groups on a polymer backbone phase separate from the second block and arrange in ordered block copolymer morphologies. These meshes align in large regular patterns upon sample preparation on macroscopically structured substrates. Patterned stable radical groups may find application in selective catalysis, energy storage, data storage, or optical gratings. In addition, gas permeable membranes with reactive sites or charge storage zones with regular spacings in redox batteries may be feasible by our approach.