Electrophoretic deposition of manganese oxide nanoparticles on aluminum substrate under different electrophoretic conditions

Mn3O4 (hausmannite) nanoparticles were synthesized by pulsed laser ablation (PLA) method in liquid environment and deposited on aluminum substrate by direct current electrophoretic deposition (DC-EPD) technique. The effects of deposition voltage and time on the characteristics of films were studied by a variety of diagnostic methods. The X-ray diffraction pattern confirms the formation of manganese oxide nanoparticles with the chemical formula of Mn3O4, known as hausmannite, which were stable during the deposition process. FESEM micrographs illustrate that with increasing the deposition voltage, the morphology of films was changed from spherical nanoparticles to nanosheets. Furthermore, the AFM studies show that parameters such as roughness, average particles size, and thickness of deposited thin films can be controlled by applied voltage and deposition time. Finally, UV-Vis-NIR spectroscopy results indicate that the reflectance patterns of the samples depend on the material of the thin films and substrate as well as the size of particles in the structure of films.

Automated summary

Mn3O4 (hausmannite) nanoparticles were synthesized using the pulsed laser ablation method in a liquid environment and deposited on an aluminum substrate using the direct current electrophoretic deposition technique. The effects of deposition voltage and time on the film characteristics were studied using various diagnostic methods. The formation of stable manganese oxide nanoparticles with the chemical formula Mn3O4 was confirmed by X-ray diffraction, and the morphology of the films changed from spherical nanoparticles to nanosheets with increasing deposition voltage. The roughness, average particle size, and thickness of the deposited thin films could be controlled by the applied voltage and deposition time, as observed by AFM studies. Additionally, the reflectance patterns of the samples depended on the material of the thin films and substrates, as well as the size of particles in the film structure, as indicated by UV-Vis-NIR spectroscopy results.