4.7 Article

Tailored thermal emission in bulk calcite through optic axis reorientation

Journal

NANOPHOTONICS
Volume 12, Issue 14, Pages 2929-2936

Publisher

WALTER DE GRUYTER GMBH
DOI: 10.1515/nanoph-2023-0005

Keywords

crystal anisotropy; far-field emissivity; tilted optic axis

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The polar nature of calcite allows for the design of spatially and spectrally coherent thermal radiation patterns through lattice vibrations stimulated by gratings and nanostructures. Understanding the fundamental emissivity properties of the lattice vibrations is essential for optimal design control over such patterned materials. By manipulating the optic axis orientation of unpatterned calcite through crystallographic off-cut, polarization, and sample rotation, the emissivity at a given frequency can vary significantly.
The polar nature of calcite results in lattice vibrations that can be stimulated through gratings and nanostructures to design spatially and spectrally coherent thermal radiation patterns. In order to obtain optimal design control over such patterned materials, it is first necessary to understand the fundamental emissivity properties of the lattice vibrations themselves. Because calcite is a uniaxial material, when the optic axis (OA) is tilted with respect to the crystal surface, the surface wave solutions to Maxwell's equations and vibrational modes that are permitted will change due to the crystal's structural anisotropy. This implies that the OA orientation can play a critical role in dictating which modes can be harnessed when designing a narrowband or angular thermal emitter. Here we explore the angle and polarization dependence of the bulk far-field emissivity of unpatterned calcite with tilted OA. We show that by manipulating the OA orientation via crystallographic off-cut, polarization, and sample rotation, the emissivity at a given frequency can vary by as much as 0.8. These results suggest that, in addition to serving as a basis for modifying the behavior of the relevant phonon polaritons, OA orientation can be used to alter the thermal emission pattern without the need for complex lithographic patterning.

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