Effect of Glue, Thiourea, and Chloride on the Electrochemical Reduction in CuSO4-H2SO4 Solutions

The effect of glue, thiourea, and chloride on the kinetics of copper reduction in CuSO4-H2SO4 solutions of copper composition, and temperatures like those used in the copper electrorefining plants, were studied. The kinetic study was conducted by determining the kinetic parameters i(0) and beta under the activation control of the Tafel approximation, which is applied to polarization curves obtained via linear voltammetry. The results show that the incorporation of glue and thiourea decreases the exchange current density, while chloride does not significantly affect the kinetic parameters. The data on the fraction of the surface covered by glue and thiourea fitted to the Temkin adsorption isotherm indicate that the mechanism of action during the reduction of copper to low overpotentials is the adsorption of these additives on the electrode surface. The adsorption of additives reduces the cathodic area available for Cu2+ adsorption and lateral diffusion of Cu atoms to continue the reduction process and the growth of the crystalline deposit. The kinetic study was complemented with a comprehensive analysis of the effect of the additives on the morphological and textural characteristics of the deposits. The results of this work contribute to the understanding of the mechanisms of the main additives used during the copper electrorefining process.

Automated summary

The effect of glue, thiourea, and chloride on the kinetics of copper reduction in CuSO4-H2SO4 solutions was studied. The results showed that glue and thiourea decrease the exchange current density, while chloride has little effect. The adsorption of these additives on the electrode surface reduces the available cathodic area for Cu2+ adsorption and the diffusion of Cu atoms.