4.7 Article

Effect of Solvent and Monomer Ratio on the Properties of Polyphenylene Sulphone

Journal

POLYMERS
Volume 15, Issue 10, Pages -

Publisher

MDPI
DOI: 10.3390/polym15102279

Keywords

polyphenylene sulfone; synthesis; solvent; monomer ratio; molecular mass; heat resistance; thermostability; membranes

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This study investigates the impact of solvent and monomer ratio on polyphenylene sulfone (PPSU) regarding molecular weight, chemical structure, and mechanical, thermal, and rheological characteristics. The use of dimethylsulfoxide (DMSO) solvent leads to cross-linking during polymer processing, increasing melt viscosity and necessitating complete removal of DMSO. N,N-dimethylacetamide proves to be the best solvent for PPSU production. Moreover, the synthesized PPSU exhibits comparable tensile modulus to the commercial analog Ultrason-P, but outperforms it in terms of tensile strength and relative elongation at break. These findings suggest the potential use of the developed PPSU for spinning hollow fiber membranes with a thin selective layer.
For the first time, the effect of the solvent and monomer ratio on molecular weight, chemical structure, and mechanical, thermal, and rheological characteristics of polyphenylene sulfone has been studied. When dimethylsulfoxide (DMSO) is used as a solvent, cross-linking occurs during the processing of the polymer, which is accompanied by an increase in melt viscosity. This fact sets a pressing need for the complete removal of DMSO from the polymer. The best solvent used for the production of PPSU is N,N-dimethylacetamide. This study of the molecular weight characteristics of polymers by gel permeation chromatography showed the stability of the polymers practically does not change with a decrease in molecular weight. The synthesized polymers correspond in tensile modulus to the commercial analog Ultrason-P, while exceeding it in terms of tensile strength and relative elongation at break. Thus, the developed polymers are promising for spinning hollow fiber membranes with a thin selective layer.

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