Journal
OPTICS EXPRESS
Volume 31, Issue 16, Pages 26451-26462Publisher
Optica Publishing Group
DOI: 10.1364/OE.494463
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This study demonstrates the first experimental success of room-temperature silicon PIN photodiodes hyperdoped with tellurium, operating in the optical telecom bands. The hyperdoped silicon material shows a strong room-temperature photoresponse in the short-wavelength infrared region due to the creation of an impurity band within the silicon band gap. The detailed description of the fabrication process, working principle, and performance, including key figures of merits, are provided.
Photonic integrated circuits require photodetectors that operate at room temperature with sensitivity at telecom wavelengths and are suitable for integration with planar complementary -metal-oxide-semiconductor (CMOS) technology. Silicon hyperdoped with deep-level impurities is a promising material for silicon infrared detectors because of its strong room-temperature photoresponse in the short-wavelength infrared region caused by the creation of an impurity band within the silicon band gap. In this work, we present the first experimental demonstration of lateral Te-hyperdoped Si PIN photodetectors operating at room temperature in the optical telecom bands. We provide a detailed description of the fabrication process, working principle, and performance of the photodiodes, including their key figure of merits. Our results are promising for the integration of active and passive photonic elements on a single Si chip, leveraging the advantages of planar CMOS technology. & COPY; 2023 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
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