Patternable quantum dot color conversion film based on photolithography technique

This paper presents a patternable two-color quantum dot (QD) color conversion film based on photolithography technique. Toluene-assisted dispersion of QD powder with the best performance matching was selected from four typical dispersions by experimental comparison. On this basis, the color conversion film of QD was prepared by photolithography technique. The experimental results show that the height of the patternable QD microstructures has good consistency. At the same time, the monochromatic spectrum test shows that the spectral characteristics of QDs are not significantly affected by the photolithographic process. Therefore, the preparation methods described in this paper can provide a reference for related research.

Automated summary

This paper presents a patternable two-color quantum dot (QD) color conversion film prepared by photolithography technique. The toluene-assisted dispersion of QD powder with the best performance matching was selected. The experimental results show that the height of the patternable QD microstructures has good consistency and the photolithographic process does not significantly affect the spectral characteristics of QDs. Therefore, the preparation methods described in this paper can provide a reference for related research.