4.7 Article

Contact on-machine measurement probe error correction method for optical aspheric surface ultraprecision machining

Journal

MEASUREMENT
Volume 214, Issue -, Pages -

Publisher

ELSEVIER SCI LTD
DOI: 10.1016/j.measurement.2023.112731

Keywords

On -machine measurement; Probe radius error; Probe profile error; Nano precision

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Optical aspheric ultraprecision machining requires nanometer-scale on-machine measurement techniques. Small probe errors in the contact OMM process can seriously affect the OMM accuracy, reducing machining accuracy. A probe correction method based on the master ball is proposed to analyze the effects of probe errors on OMM results and establish an identification and correction model for probe errors. The effectiveness of this method is verified through OMM probe error correction measurement and error compensation machining experiments.
Optical aspheric ultraprecision machining requires nanometer-scale on-machine measurement (OMM) tech-niques, and small probe errors in the contact OMM process can seriously affect the OMM accuracy, thereby reducing machining accuracy. Thus, a master ball-based probe radius error and probe profile error correction method is proposed to analyze the effects of probe radius error and probe profile error on OMM results while ensuring accurate probe alignment to establish an identification and correction model for probe radius error and probe profile error. OMM probe error correction measurement and error compensation machining experiments were conducted to verify the effectiveness of the probe error correction method. After the probe profile error correction measurement, the probe measurement error was changed from 0.436 mu m to 0.023 mu m. Compared with the uncorrected probe error and the probe radius error correction compensation machining results, the accuracy of the compensation machining after the probe profile error correction compensation was improved by 43 % and 41 %, respectively. Results show that this OMM system probe error correction method is effective in improving OMM accuracy.

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