Journal
ADVANCED MATERIALS
Volume 27, Issue 42, Pages 6683-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201502866
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Funding
- Office of Naval Research MURI Program [N00014-11-1-0690]
- Northwestern University Materials Research Science and Engineering Center (NSF) [DMR-1121262]
- Department of Defense (DoD) through the National Defense Science and Engineering Graduate (NDSEG) Fellowship Program
- Ryan Fellowship
- NSF MRSEC Program of the Materials Research Center at Northwestern University [DMR-1121262]
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Intense pulsed light (IPL) annealing of graphene inks is demonstrated for rapid post-processing of inkjet-printed patterns on various substrates. A conductivity of approximate to 25 000 S m(-1) is achieved following a single printing pass using a concentrated ink containing 20 mg mL(-1) graphene, establishing this strategy as a practical and effective approach for the versatile and high-performance integration of graphene in printed and flexible electronics.
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