Journal
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 34, Issue 11, Pages -Publisher
SPRINGER
DOI: 10.1007/s10854-023-10432-8
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AgBr/Bi2SiO5 photocatalyst with Z-scheme structure was synthesized and showed high photocatalytic activity for RhB degradation under visible light irradiation. The degradation efficiency remained above 81.7% after five cycles of reuse. The Z-scheme structure facilitated charge carrier separation and dye sensitization effect, providing valuable insights for developing other Z-scheme photocatalysts.
AgBr/Bi2SiO5 photocatalyst with Z-scheme structure was obtained via a hydrothermal reaction, calcination, and in situ precipitation process. The as-prepared AgBr/Bi2SiO5 composite photocatalytically degraded 96.2% of RhB under visible light irradiation within 30 min. Moreover, the photodegradation efficiency remained above 81.7% after being reused five times. Trapping experiments revealed that center dot O2- was the main reactive species during RhB photodegradation. The degradation mechanism study of AgBr/Bi2SiO5 showed that the Z-scheme structure between AgBr and Bi2SiO5 facilitated the separation of charge carriers, thereby improving the photocatalytic degradation with the assistance of a dye sensitization effect. This work provides a reference for developing other Z-scheme photocatalysts for the removal of organic pollutants.
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