4.6 Article

Structural properties of MBE-grown CdTe (133)B buffer layers on GaAs (211)B substrates with CdZnTe/CdTe superlattice-based dislocation filtering layers

Journal

JOURNAL OF APPLIED PHYSICS
Volume 133, Issue 18, Pages -

Publisher

AIP Publishing
DOI: 10.1063/5.0143854

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The demand for high-performance HgCdTe infrared detectors has led to research on heteroepitaxial growth of HgCdTe and CdTe buffer layers on alternative substrates. This study focuses on the structural properties of CdTe (133)B-oriented buffer layers on GaAs (211)B substrates. By incorporating dislocation filtering layers, the material quality and surface roughness of (133)B-oriented CdTe buffer layers have been improved, making it a feasible approach for growing high-quality CdTe and HgCdTe materials on cost-effective substrates.
The ever-present demand for high-performance HgCdTe infrared detectors with larger array size and lower cost than currently available technologies based on lattice-matched CdZnTe (211)B substrates has fuelled research into heteroepitaxial growth of HgCdTe and CdTe buffer layers on lattice-mismatched alternative substrates with a (211)B orientation. Driven by the large lattice mismatch, the heteroepitaxial growth of (Hg)CdTe can result in (133)B-orientated material, which, however, has been less explored in comparison to (211)B-oriented growth. Herein, we report on the structural properties of heteroepitaxially grown single-crystal II-VI CdTe (133)B-oriented buffer layers on III-V GaAs (211)B substrates. Azimuthal-dependent x-ray double-crystal rocking curve measurements for the CdTe buffer layers show that the full-width at half-maximum value obtained along the GaAs [ 1 over bar 11 ] direction is narrower than that obtained along the GaAs [ 01 1 over bar ] direction, which is presumably related to the in-plane anisotropic structural characteristics of the grown CdTe layers. By incorporating strained CdZnTe/CdTe superlattice-based dislocation filtering layers (DFLs), a significant improvement in material quality has been achieved in (133)B-orientated CdTe buffer layers, including a reduced etch pit density in the low-10(5) cm(-2) range and improved surface roughness. These results indicate that the CdTe (133)B DFL buffer layer process is a feasible approach for growing high-quality CdTe and HgCdTe materials on large-area, low-cost alternative substrates.

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