Journal
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 947, Issue -, Pages -Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2023.169540
Keywords
Crystal growth; Half-metal; Transmission electron microscopy (TEM); Synchrotron radiation; Magnetic measurements
Ask authors/readers for more resources
This paper reports on the growth of epitaxial Fe3Si ultra-thin films by pulsed laser deposition on SrTiO3(001) substrates and analyzes the effect of deposition temperature on the structural, morphological, and magnetic properties of the films. The results show that the best magnetic response is achieved at 200°C, which represents the optimal compromise between phase purity and interface quality.
The development of devices relying on spin phenomena requires of an ideal spin polarized electron source. This can be achieved by taking advantage of half-metallic full Heusler alloy thin films. However, their implementation requires a controlled growth of stoichiometric films with large activation volumes. In this work, we report on the growth of epitaxial Fe3Si ultra-thin films by pulsed laser deposition on SrTiO3(001) substrates, analyzing the effect of deposition temperature in the structural, morphological and magnetic properties of the deposited films. We conclude that optimal compromise between phase purity and in-terface quality is obtained at 200 oC, obtaining the best magnetic response under this condition. (c) 2023 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available