Related references
Note: Only part of the references are listed.PECVD low and ultralow dielectric constant materials: From invention and research to products
Alfred Grill
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2016)
Silicon Oxycarbide Thin Films by Remote Microwave Hydrogen Plasma CVD Using a Tetramethyldisiloxane Precursor
Aleksander M. Wrobel et al.
CHEMICAL VAPOR DEPOSITION (2015)
Superior radiation tolerant materials: Amorphous silicon oxycarbide
Michael Nastasi et al.
JOURNAL OF NUCLEAR MATERIALS (2015)
On the thermodynamically stable amorphous phase of polymer-derived silicon oxycarbide
Liping Yu et al.
SCIENTIFIC REPORTS (2015)
Hydrogenated Si-O-C nanoparticles: Synthesis, structure, and thermodynamic stability
Amir H. Tavakoli et al.
JOURNAL OF MATERIALS RESEARCH (2015)
White Si-O-C Ceramic: Structure and Thermodynamic Stability
Amir H. Tavakoli et al.
JOURNAL OF THE AMERICAN CERAMIC SOCIETY (2015)
Analysis of Low-k Dielectric Thin Films on Thick Substrates by Transmission FTIR Spectroscopy
Milan Milosevic et al.
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2015)
Progress and New Directions in Calorimetry: A 2014 Perspective
Alexandra Navrotsky
JOURNAL OF THE AMERICAN CERAMIC SOCIETY (2014)
Pyrolysis kinetics and pathway of polysiloxane conversion to an amorphous SiOC ceramic
Xiujun Wang et al.
JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY (2014)
Progress in the development and understanding of advanced low k and ultralow k dielectrics for very large-scale integrated interconnects-State of the art
Alfred Grill et al.
APPLIED PHYSICS REVIEWS (2014)
Tunable Plasticity in Amorphous Silicon Carbide Films
Yusuke Matsuda et al.
ACS APPLIED MATERIALS & INTERFACES (2013)
Plasma processing of low-k dielectrics
Mikhail R. Baklanov et al.
JOURNAL OF APPLIED PHYSICS (2013)
Mechanical properties of high porosity low-k dielectric nano-films determined by Brillouin light scattering
S. Bailey et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2013)
Oxidation process of white Si-O-C(-H) ceramics with various hydrogen contents
Masaki Narisawa et al.
SCRIPTA MATERIALIA (2013)
Polymer-derived SiCN and SiOC ceramics - structure and energetics at the nanoscale
Gabriela Mera et al.
JOURNAL OF MATERIALS CHEMISTRY A (2013)
Effect of boron on the thermodynamic stability of amorphous polymer-derived Si-(B-)C-N ceramics
Amir H. Tavakoli et al.
ACTA MATERIALIA (2012)
A method to extract absorption coefficient of thin films from transmission spectra of the films on thick substrates
Sean W. King et al.
JOURNAL OF APPLIED PHYSICS (2012)
Development of low-k precursors for next generation IC manufacturing
Francois Doniat et al.
MICROELECTRONIC ENGINEERING (2012)
Effects of composition and thermal annealing on the mechanical properties of silicon oxycarbide films
Ping Du et al.
SENSORS AND ACTUATORS A-PHYSICAL (2012)
X-ray photoelectron spectroscopy investigation of the Schottky barrier at low-k a-SiO(C):H/Cu interfaces
S. W. King et al.
APPLIED PHYSICS LETTERS (2011)
Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC:H thin films
S. W. King et al.
JOURNAL OF NON-CRYSTALLINE SOLIDS (2011)
Adhesion energies of Cr thin films on polyimide determined from buckling: Experiment and model
M. J. Cordill et al.
ACTA MATERIALIA (2010)
The mechanism of low-k SiOCH film modification by oxygen atoms
O. V. Braginsky et al.
JOURNAL OF APPLIED PHYSICS (2010)
On the effects of thermal treatment on the composition, structure, morphology, and optical properties of hydrogenated amorphous silicon-oxycarbide
Spyros Gallis et al.
JOURNAL OF MATERIALS RESEARCH (2009)
Thermodynamically stable SixOyCz polymer-like amorphous ceramics
Tamas Varga et al.
JOURNAL OF THE AMERICAN CERAMIC SOCIETY (2007)
Comparative study of the effects of thermal treatment on the optical properties of hydrogenated amorphous silicon-oxycarbide
Spyros Gallis et al.
JOURNAL OF APPLIED PHYSICS (2007)
Preparation and structure of porous dielectrics by plasma enhanced chemical vapor deposition
S. M. Gates et al.
JOURNAL OF APPLIED PHYSICS (2007)
Mechanical characterization of a polysiloxane-derived SiOC glass
Claude Moysan et al.
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY (2007)
Precursor chemistry for ULK CVD
V Rouessac et al.
MICROELECTRONIC ENGINEERING (2005)
Silicon oxycarbide glasses for blood-contact applications
R Zhuo et al.
ACTA BIOMATERIALIA (2005)
Chemical bonding structure of low dielectric constant Si : O : C : H films characterized by solid-state NMR
PY Mabboux et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2005)
Vibrational spectroscopy characterization of low-dielectric constant SiOC:H films prepared by PECVD technique
G Das et al.
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING (2004)
Challenges for structural stability of ultra-low-k-based interconnects
F Iacopi et al.
MICROELECTRONIC ENGINEERING (2004)
Structure of low dielectric constant to extreme low dielectric constant SiCOH films: Fourier transform infrared spectroscopy characterization
A Grill et al.
JOURNAL OF APPLIED PHYSICS (2003)
Low dielectric constant materials for microelectronics
K Maex et al.
JOURNAL OF APPLIED PHYSICS (2003)
FactSage thermochemical software and databases
C Bale et al.
CALPHAD-COMPUTER COUPLING OF PHASE DIAGRAMS AND THERMOCHEMISTRY (2002)
Heat and moisture resistance of siloxane-based low-dielectric-constant materials
T Furusawa et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2001)
Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition
A Grill et al.
APPLIED PHYSICS LETTERS (2001)
Characterization of carbon-doped SiO2 low k thin films -: Preparation by plasma-enhanced chemical vapor deposition from tetramethylsilane
LCM Han et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2001)
Share Paper
