Related references
Note: Only part of the references are listed.RF magnetron sputtered AlCoCrCu0.5FeNi high entropy alloy (HEA) thin films with tuned microstructure and chemical composition
Naveed A. Khan et al.
JOURNAL OF ALLOYS AND COMPOUNDS (2020)
Microstructure and scratch analysis of aluminium thin films sputtered at varying RF power on stainless steel substrates
F. M. Mwema et al.
COGENT ENGINEERING (2020)
Effect of varying low substrate temperature on sputtered aluminium films
F. M. Mwema et al.
MATERIALS RESEARCH EXPRESS (2019)
Fractal analysis of hillocks: A case of RF sputtered aluminum thin films
Fredrick M. Mwema et al.
APPLIED SURFACE SCIENCE (2019)
Surface Integrity of TiC Thin Film Produced by RF Magnetron Sputtering
Abegunde O. Olayinka et al.
2ND INTERNATIONAL CONFERENCE ON SUSTAINABLE MATERIALS PROCESSING AND MANUFACTURING (SMPM 2019) (2019)
Micromorphology of sputtered aluminum thin films: A fractal analysis
F. M. Mwema et al.
MATERIALS TODAY-PROCEEDINGS (2019)
Growth (AlCrNbSiTiV)N thin films on the interrupted turning and properties using DCMS and HIPIMS system
Kai-Sheng Chang et al.
APPLIED SURFACE SCIENCE (2018)
Characterization of microroughness parameters in gadolinium oxide thin films: A study based on extended power spectral density analyses
M Senthilkumar et al.
APPLIED SURFACE SCIENCE (2005)
Roughness parameters
ES Gadelmawla et al.
JOURNAL OF MATERIALS PROCESSING TECHNOLOGY (2002)
Share Paper
